Fig. 2: Fabrication and micro-morphology of the ultra-sensitive μ-TED.
From: Ultra-sensitive micro thermoelectric device for energy harvesting and ultra-low airflow detection
a, f The MEMS-based fabrication process of the μ-TED. a Fabrication of bottom seed layer and photolithograph of n-type pattern. b Electrochemical deposition of n-type Bi2Te3. c Photolithograph and electrochemical deposition of p-type Sb2Te3. d Photolithographing etching of bottom electrode pattern. e Electroplate of top connection layer. f Etching top seed layer and releasing residual photoresist. g Optical image of as-fabricated μ-TED. The red line means the test region of the step profiler. h The height data of the top surface of the μ-TED
