Fig. 1: Bulk structural characterization of HD-LNMO-102, 108, 114, and 120.
From: Tuning Li occupancy and local structures for advanced Co-free Ni-rich positive electrodes
Stacked plots of (a) SXRD patterns and (b) ND patterns collected from the as-synthesized materials. The wavelengths are 0.2073 Å and 1.594 Å for SXRD and ND data, respectively. Example of simultaneous Rietveld refinements of HD-LNMO-120 to (c) SXRD pattern and (d) ND pattern. e Refined atomic parameters as a function of Li content, including Ni in the Li layers (NiLi), Li in the TM layers (LiTM), and Lisole in the TM layers (obtained by subtracting NiLi from LiTM). The error bars in (e) are produced during the combined refinement.
