Fig. 2: Ferroelastic writing and crystal direction selection.
From: Ferroelastic writing of crystal directions in oxide thin films
a, Schematic distribution of the shear stress σ13 under the AFM tip loading. There are two lobes for positive or negative shear stresses, as indicated by the rhombus symbol. b, Schematic of crystal shearing by the trailing σ13 according to the fast and slow scan axes. c,d, ECC images demonstrating deterministic ferroelastic writing, corresponding to four-variant (c) and three-variant (d) crystal direction selection in SrRuO3 (001) and (111) thin films, respectively. X, \(\overline{X}\), Y and \(\overline{Y}\) indicate the ferroelastic domains shearing along x, −x, y and −y directions, respectively, for SrRuO3 (001). X1, X2 and X3 indicate the ferroelastic domains shearing along one of the equivalent \(\langle 11\overline{2}\rangle\) directions (marked as x1, x2 and x3) in SrRuO3 (111).
