Extended Data Fig. 1: Microscope and AFM images during the device 1 fabrication process.
From: Unconventional superconducting quantum criticality in monolayer WTe2
a, Bottom gate and metal electrodes after AFM tip clean. b, Dark field optical image of the bottom part. c, Tapping-mode AFM image of the metal electrodes. d, Microscope image of monolayer WTe2 flake exfoliated in the glovebox. e, Microscope image of device 1 after transferring the top gate and monolayer WTe2. The monolayer WTe2 flake is outlined in red. Top and bottom graphite flakes are outlined in yellow and orange. f, Dark field optical image of device 1. No bubbles were observed.
