Table 2 Absorptivity of SiO2 film and HfO2 film annealed at different temperatures.
From: Interface and material engineering for zigzag slab lasers
Films | SiO2 unannealed | HfO2 unannealed | HfO2 annealed at 400 deg | HfO2 annealed at 500 deg | HfO2 annealed at 600 deg |
|---|---|---|---|---|---|
Absorptivity (cm−1) | 3.7 × 10−2 | 3.1 | 7.0 × 10−1 | 5.2 × 10−2 | 4.5 × 10−2 |
