Figure 1
From: Characterisation of graphene electrodes for microsystems and microfluidic devices

Graphene fabrication is shown with (a) the mask pattern developed to fabricate the graphene electrodes along with the images captured by the complementary metal-oxide-semiconductor (CMOS) image sensor of the (b–i) eight electrode gaps with decreasing sizes of g = 500, 400, 300, 200, 180, 160, 140, and 120 μm, respectively, at the optimal number of doses through the optical disc drive (n = 5).