Fig. 1: Exemplary liquid phase exfoliation methods used to prepare thin films.
From: Exfoliation procedure-dependent optical properties of solution deposited MoS2 films
Schematics are shown for (a) SME MoS2, (b) CEPR MoS2, and (c) RE and NRE MoS2. Note that (c) shows the generalized scheme for RE MoS2. In comparison, NRE MoS2 is prepared without synthetic oxidation and reduction reagents (e.g., such as with cumene hydroperoxide and hydroquinone, respectively) and represents the first step in (c) with native CVT MoS2 powder conditions. NRE MoS2 is considered part of the redox exfoliation methodology due to the formation of native MOP species. These four exfoliation methods produce the four different procedure-dependent semiconducting exfoliated MoS2 assessed herein.
