Fig. 4: Area-selected ALD of 2D materials.
From: Advance in additive manufacturing of 2D materials at the atomic and close-to-atomic scale
a ALD process based on a resist grows patterned MoS by either maskless photolithography or electron-beam lithography. Reproduced from ref. 59 with permission from John Wiley and Sons, Copyright 2017. b Area-selective ALD process of MoS2 on different surfaces (SiO2 and Al) based on self-etching by prolonged MoCl5 injection. Reproduced from ref. 62 with permission from John Wiley and Sons, Copyright 2021. c Area-selective ALD process for WS2 using ABC-type ALD cycles based on inhibitor molecules. Reproduced from ref. 63 with permission from American Chemical Society, Copyright 2020.
