Fig. 4: Stitched optical microscopy cross-sections of Cu pillars produced using parallelized EFAS.
From: High-throughput synthesis of high-entropy alloys via parallelized electric field assisted sintering
Target pillar heights including the chamfered bases are (a) 3 mm, b 5 mm, c 7 mm, d 9 mm, e 11 mm, f 13 mm, and (g) 15 mm.
