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Plasma Polymerization of Hexamethyldisilazane
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  • Regular Article
  • Published: 01 March 1990

Plasma Polymerization of Hexamethyldisilazane

  • Soo Young Park1,
  • Nakjoong Kim1,
  • Un Young Kim1,
  • Sung Il Hong2 &
  • …
  • Hiroyuki Sasabe3 

Polymer Journal volume 22, pages 242–249 (1990)Cite this article

  • 1428 Accesses

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Abstract

The chemical structure, density, and deposition rate of hexamethyldisilazane plasma polymer were investigated in terms of reaction conditions, such as discharge power (W) and mass flow rate (Fm). The importance of the specific energy per mass (W/Fm) as the major controlling parameter of plasma polymerization was confirmed in this study. A notable infiuence of W/Fm on the chemical structure corresponded with the changes in density and deposition yield of plasma polymer. Deposition rate equation was proposed from the simplified model of plasma polymerization. Regression analysis of the experimental data supported the equation.

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Author information

Authors and Affiliations

  1. Polymer Chemistry Laboratory, Korea Institute of Science and Technology,

    Soo Young Park, Nakjoong Kim & Un Young Kim

  2. Department of Textile Engineering, Seoul National University,

    Sung Il Hong

  3. Biopolymer Physics Laboratory, The Institute of Physical and Chemical Research (RIKEN),

    Hiroyuki Sasabe

Authors
  1. Soo Young Park
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  2. Nakjoong Kim
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  3. Un Young Kim
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  4. Sung Il Hong
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  5. Hiroyuki Sasabe
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Park, S., Kim, N., Kim, U. et al. Plasma Polymerization of Hexamethyldisilazane. Polym J 22, 242–249 (1990). https://doi.org/10.1295/polymj.22.242

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  • Issue Date: 01 March 1990

  • DOI: https://doi.org/10.1295/polymj.22.242

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Keywords

  • Plasma Polymerization
  • Organosilicon
  • Hexamethyldisilazane
  • FT IR
  • Density
  • Deposition Rate

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