Fig. 6: 3D full-wave electromagnetic simulation.
From: Capillary-force-induced collapse lithography for controlled plasmonic nanogap structures
An unpolarized light source incident on the structure in the −z direction was used, and the electric field distribution at 900 nm was calculated. The refractive index of the nanopillars is 1.6, and Palik’s experimental value was used for the gold thin film32. a 3D schematic of the bowtie-shaped structure. The yellow color represents the covering gold thin layer. b 3D electric field distribution of the bowtie-shaped structure. cxy plane cross-section view at z = 225 nm. dxz plane cross-section view at the center. e 3D schematic of the flower-shaped structure (the red-colored part represents photoresist and the yellow-colored part represents the covering gold thin layer). f 3D electric field distribution of the flower-shaped structure. gxy plane cross-section view at z = 275 nm (top of the pillar). hxy plane cross-section view at z = 140 nm (middle of the pillar)
