Fig. 3: SEM images of various nanostructures transferred by SENTL. | Microsystems & Nanoengineering

Fig. 3: SEM images of various nanostructures transferred by SENTL.

From: High-fidelity and clean nanotransfer lithography using structure-embedded and electrostatic-adhesive carriers

Fig. 3

a High-resolution Au nanogratings with 40-nm spacing. b 700-nm-period Cu nanodisks of uniform diameters with a standard deviation of 2.8 nm. c 550-nm-period Au nanohole array. d High-aspect-ratio Cu nanogratings with 300-nm width and 600-nm height. e Quasi-3D Z-shaped Ni nanostructures. f Stacked-mesh nanostructure fabricated by double SENTL transfer. g–i Transferred 700-nm-period Pd, Co, and Au nanodisks, and j corresponding EDX spectrum in i indicating a residue-free transfer. Scale bars: 300 nm (a, insets in c, f), 500 nm (b, d, e, g–j), and 1000 nm (c, f, inset in d)

Back to article page