Fig. 4: Emergence of topological Hall effect in HxSrRuO3.

a Ex-situ measured proton distribution profile in a sample (~32 nm) with topological Hall effect. b P-polarized SHG intensity as a function of the polarization direction of the incident light (0 corresponds to s-polarization) for both pristine SrRuO3 and gated HxSrRuO3 films. The weaker SHG in the pristine film is due to surface contributions, while the enhanced SHG intensity of the HxSrRuO3 state suggests the breaking of inversion symmetry in bulk. c Magnetic field dependent Hall resistivity for HxSrRuO3 gated with VG = 1.8 V at different temperatures. The blue and red arrows denote the field sweeping direction. Ordinary Hall term is subtracted through the linear fitting of RHB at higher magnetic fields. An offset is applied per curve for clarity, while the dotted lines denote the center of the hysteresis loops. The estimated topological Hall resistivity with different signs is marked with different colors. d Color map of estimated topological hall resistivity \(\left( {\rho _{YX}^{\mathrm{T}}} \right)\) and characteristic fields (HC and HP) obtained at HxSrRuO3 gated with VG = 1.8 V. HC (black filled symbol) represents the coercive field and the HP (white open diamond) denotes the field where the topological Hall resistivity reaches its maximum.